Parallel near-field photolithography with metal-coated elastomeric masks

Jin Wu, Cheng Han Yu, Shaozhou Li, Binghua Zou, Yayuan Liu, Xiaoqun Zhu, Yuanyuan Guo, Hongbo Xu, Weina Zhang, Liping Zhang, Bin Liu, Danbi Tian, Wei Huang, Michael Sheetz, Fengwei Huo

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Developing a cost-effective nanolithography strategy that enables the production of subwavelength features with various shapes over large areas is a long-standing goal in the nanotechnology community. Herein, an inexpensive nanolithographic technique that combines the wafer-scale production capability of photolithography with the subwavelength feature size controllability of near-field photolithography was developed to fabricate centimeter-scale up to wafer-scale sub-100-nm variously shaped nanopatterns on surfaces. The wafer-scale elastomeric trench-based photomasks with subwavelength apertures created at the apexes were compatible with mask aligners, allowing for the production of wafer-scale subwavelength nanopatterns with adjustable feature sizes, shapes, and periodicities. The smallest feature sizes of 50 and 80 nm were achieved on positive tone and negative tone photoresist surfaces, respectively, which could be ascribed to a near-field optical effect. The fabricated centimeter-scale nanopatterns were functionalized to study cell-matrix adhesion and migration. Compared to currently developed nanolithographic methods that approach similar functionalities, this facile nanolithographic strategy combines the merits of low cost, subwavelength feature size, high throughput, and varied feature shapes, making it an affordable approach to be used in academic research for researchers at most institutions.

Original languageEnglish (US)
Pages (from-to)1210-1217
Number of pages8
JournalLangmuir
Volume31
Issue number3
DOIs
StatePublished - Jan 27 2015
Externally publishedYes

Fingerprint

Photolithography
photolithography
Masks
near fields
masks
Metals
wafers
metals
Nanolithography
Photomasks
Photoresists
Controllability
Nanotechnology
Costs
Adhesion
Throughput
photomasks
controllability
nanotechnology
photoresists

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Wu, J., Yu, C. H., Li, S., Zou, B., Liu, Y., Zhu, X., ... Huo, F. (2015). Parallel near-field photolithography with metal-coated elastomeric masks. Langmuir, 31(3), 1210-1217. https://doi.org/10.1021/la504260x

Parallel near-field photolithography with metal-coated elastomeric masks. / Wu, Jin; Yu, Cheng Han; Li, Shaozhou; Zou, Binghua; Liu, Yayuan; Zhu, Xiaoqun; Guo, Yuanyuan; Xu, Hongbo; Zhang, Weina; Zhang, Liping; Liu, Bin; Tian, Danbi; Huang, Wei; Sheetz, Michael; Huo, Fengwei.

In: Langmuir, Vol. 31, No. 3, 27.01.2015, p. 1210-1217.

Research output: Contribution to journalArticle

Wu, J, Yu, CH, Li, S, Zou, B, Liu, Y, Zhu, X, Guo, Y, Xu, H, Zhang, W, Zhang, L, Liu, B, Tian, D, Huang, W, Sheetz, M & Huo, F 2015, 'Parallel near-field photolithography with metal-coated elastomeric masks', Langmuir, vol. 31, no. 3, pp. 1210-1217. https://doi.org/10.1021/la504260x
Wu J, Yu CH, Li S, Zou B, Liu Y, Zhu X et al. Parallel near-field photolithography with metal-coated elastomeric masks. Langmuir. 2015 Jan 27;31(3):1210-1217. https://doi.org/10.1021/la504260x
Wu, Jin ; Yu, Cheng Han ; Li, Shaozhou ; Zou, Binghua ; Liu, Yayuan ; Zhu, Xiaoqun ; Guo, Yuanyuan ; Xu, Hongbo ; Zhang, Weina ; Zhang, Liping ; Liu, Bin ; Tian, Danbi ; Huang, Wei ; Sheetz, Michael ; Huo, Fengwei. / Parallel near-field photolithography with metal-coated elastomeric masks. In: Langmuir. 2015 ; Vol. 31, No. 3. pp. 1210-1217.
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