Parallel near-field photolithography with metal-coated elastomeric masks

Jin Wu, Cheng Han Yu, Shaozhou Li, Binghua Zou, Yayuan Liu, Xiaoqun Zhu, Yuanyuan Guo, Hongbo Xu, Weina Zhang, Liping Zhang, Bin Liu, Danbi Tian, Wei Huang, Michael P. Sheetz, Fengwei Huo

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