Structural basis for the suppression of skin cancers by DNA polymerase

Timothy D. Silverstein, Robert E. Johnson, Rinku Jain, Louise Prakash, Satya Prakash, Aneel K. Aggarwal

Research output: Contribution to journalArticle

106 Scopus citations

Abstract

DNA polymerase (Pol) is unique among eukaryotic polymerases in its proficient ability for error-free replication through ultraviolet-induced cyclobutane pyrimidine dimers, and inactivation of Pol (also known as POLH) in humans causes the variant form of xeroderma pigmentosum (XPV). We present the crystal structures of Saccharomyces cerevisiae Pol (also known as RAD30) in ternary complex with a cis-syn thymine-thymine (T-T) dimer and with undamaged DNA. The structures reveal that the ability of Pol to replicate efficiently through the ultraviolet-induced lesion derives from a simple and yet elegant mechanism, wherein the two Ts of the T-T dimer are accommodated in an active site cleft that is much more open than in other polymerases. We also show by structural, biochemical and genetic analysis that the two Ts are maintained in a stable configuration in the active site via interactions with Gln 55, Arg 73 and Met 74. Together, these features define the basis for Polĝ€ ™s action on ultraviolet-damaged DNA that is crucial in suppressing the mutagenic and carcinogenic consequences of sun exposure, thereby reducing the incidence of skin cancers in humans.

Original languageEnglish (US)
Pages (from-to)1039-1043
Number of pages5
JournalNature
Volume465
Issue number7301
DOIs
StatePublished - Jun 24 2010

ASJC Scopus subject areas

  • General

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    Silverstein, T. D., Johnson, R. E., Jain, R., Prakash, L., Prakash, S., & Aggarwal, A. K. (2010). Structural basis for the suppression of skin cancers by DNA polymerase. Nature, 465(7301), 1039-1043. https://doi.org/10.1038/nature09104